(Total: 21, Granted: KR 3 / JP 1, Applications: KR 7 / US 4 / EP 2 / JP 1 / CN 2 / TW 1)
- KR Patent 10-2539172
- JP Patent 7704355
- US Patent Application 18/289,189
- EP Patent Application 21964180.0
- CN Patent Application 202180099397.2
- (PCT/KR2021/016560)
Composite polishing pad including highly abrasion-resistant thin film coating bound with carbon nanotubes, and method for producing the same
- KR Patent 10-2531705
- US Patent Application 18/289,607
- EP Patent Application 21964181.8
- JP Patent Application 2023-571624
- CN Patent Application 202180099396.8
- (PCT/KR2021/016562)
Composite polishing pad including carbon nanotubes, and method for producing the same
- KR Patent Application 10-2022-0002523 (Received Best Collaborative Patent Award)
- US Patent Application 17/805,735
- TW Patent Application 111121265
Polishing pad, chemical mechanical polishing apparatus including the same, and method for manufacturing semiconductor device using the same
- KR Patent Application 10-2025-0091017
Electrical signal measurement system having a hierarchical surface microstructure impregnated with conductive material
- KR Patent Application 10-2024-0110413
Fixed-abrasive polishing pad using vertically aligned carbon nanotube and method of manufacturing the same
- KR Patent Application 10-2024-0058665
Polishing processing method and polishing processing equipment
- KR Patent Application 10-2023-0187811
Plastic molding device for polishing pad, chemical mechanical polishing device including same, and method of controlling surface roughness of polishing pad using same
- KR Patent Application 10-2023-0139596
Semiconductor circuit manufacturing method
- KR Patent Application 10-2020-0134670
Design Method of Ionizer Anti-Virus Ventilation and Ventilation System for Protection Using a Voltage Type Copper hierarchy Filter
